ENHANCED CARRIER LIFETIME AND DIFFUSION LENGTH IN GAAS BY STRAINED-LAYER MOCVD

被引:19
作者
BENEKING, H
NAROZNY, P
ROENTGEN, P
YOSHIDA, M
机构
关键词
D O I
10.1109/EDL.1986.26308
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:101 / 103
页数:3
相关论文
共 12 条
[1]   HIGH-QUALITY EPITAXIAL GAAS AND INP WAFERS BY ISOELECTRONIC DOPING [J].
BENEKING, H ;
NAROZNY, P ;
EMEIS, N .
APPLIED PHYSICS LETTERS, 1985, 47 (08) :828-830
[2]  
BENEKING H, 1985, ESSDERC AACHEN
[3]  
BENEKING H, 1985, ELECTRONIC MATERIALS
[4]  
BENEKING H, 1985, INT S GAAS RELATED C, P12
[5]  
EMEIS N, 1985, 2 SOTAPOCS TOR
[6]   ORGANOMETALLIC VPE GROWTH OF INAS1-XSBX ON INAS [J].
FUKUI, T ;
HORIKOSHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (01) :L53-L56
[7]  
Lindmayer J., 1965, Fundamentals of Semiconductor Devices
[8]  
NEUBERGER M, 1971, HDB ELECTRONIC MATER, V2
[9]  
ROENTGEN P, 1985, INT S GAAS RELATED C, P12
[10]  
ROTH W, 1983, MAT RES S P, V17, P291