SILICIDE FORMATION IN LATERAL DIFFUSION COUPLES

被引：40

作者：

ZHENG, LR ^{[1
]}

HUNG, LS ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571994

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：758 / 761

页数：4

共 8 条

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[2] GOSELE U, 1981, J APPL PHYS, V53, P5232
[3] REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05): : 1112 - 1119
[4] OTTAVIANI G, 1982, RELIABILITY DEGRADAT, pCH2
[5] SEQUENCE OF PHASE FORMATION IN PLANAR METAL-SI REACTION COUPLES
TSAUR, BY
LAU, SS
MAYER, JW
NICOLET, MA
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 922 - 924
[6] TU KN, 1978, THIN FILMS INTERDIFF, pCH10
[7] TU KN, UNPUB J APPL PHYS
[8] LATERAL DIFFUSION OF NI AND SI THROUGH NI2SI IN NI/SI COUPLES
ZHENG, LR
HUNG, LS
MAYER, JW
MAJNI, G
OTTAVIANI, G
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (07) : 646 - 649