LOW-ENERGY (LESS-THAN-OR-EQUAL-TO-100 EV) SPUTTERING OF THIN MOLYBDENUM NITRIDE FILMS

被引：10

作者：

BALDWIN, DA

SHAMIR, N

HOCHMANN, P

RABALAIS, JW

机构：

来源：

SURFACE SCIENCE | 1983年 / 130卷 / 02期

关键词：

D O I：

10.1016/0039-6028(83)90367-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：361 / 372

页数：12

相关论文

共 39 条

[1] DESIGN-FEATURES AND FOCAL PROPERTIES OF SIMPLE 3 ELEMENT 2-DIMENSIONAL OR 3-DIMENSIONAL LENS SYSTEMS FOR DECELERATING INTENSE ION-BEAMS TO VERY LOW ENERGIES
ALTON, GD
ROBERTO, JB
WHITE, CW
ZUHR, RA
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 177 (2-3): : 273 - 280
[2] DEPTH RESOLUTION OF SPUTTER PROFILING
ANDERSEN, HH
[J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140
[3] ANDERSEN HH, 1982, ADV ION IMPLANTATION
[4] ANDERSEN HH, 1980, PHYSICS IONIZED GASE, P431
[5] MOLYBDENUM NITRIDE FILM GROWTH BY REACTION WITH N-2+ AND N+ BEAMS - ENERGY AND DOSE DEPENDENCE
BALDWIN, DA
SHAMIR, N
RABALAIS, JW
[J]. APPLICATIONS OF SURFACE SCIENCE, 1982, 11-2 (JUL): : 229 - 234
[6] KINETIC-ENERGY DEPENDENCE OF THE REACTIONS OF N+ AND N2(+) WITH MOLYBDENUM
BALDWIN, DA
MURRAY, PT
RABALAIS, JW
[J]. CHEMICAL PHYSICS LETTERS, 1981, 77 (02) : 403 - 404
[7] BALDWIN DA, UNPUB REV SCI INSTR
[8] SPUTTERING MECHANISM FOR LOW-ENERGY LIGHT-IONS
BEHRISCH, R
MADERLECHNER, G
SCHERZER, BMU
ROBINSON, MT
[J]. APPLIED PHYSICS, 1979, 18 (04): : 391 - 398
[9] AN ANALYTICAL FORMULA AND IMPORTANT PARAMETERS FOR LOW-ENERGY ION SPUTTERING
BOHDANSKY, J
ROTH, J
BAY, HL
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2861 - 2865
[10] IMPORTANT SPUTTERING YIELD DATA FOR TOKAMAKS - A COMPARISON OF MEASUREMENTS AND ESTIMATES
BOHDANSKY, J
[J]. JOURNAL OF NUCLEAR MATERIALS, 1980, 93-4 (OCT) : 44 - 60

← 1 2 3 4 →