HILLOCK GROWTH-KINETICS IN THIN PB-IN-AU FILMS

被引：19

作者：

HUANG, HCW ^{[1
]}

CHAUDHARI, P ^{[1
]}

KIRCHER, CJ ^{[1
]}

MURAKAMI, M ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES | 1986年 / 54卷 / 04期

关键词：

D O I：

10.1080/01418618608243615

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：583 / 599

页数：17

共 22 条

[1] STRUCTURE OF TUNNEL BARRIER OXIDE FOR PB-ALLOY JOSEPHSON-JUNCTIONS [J].

BAKER, JM ;

KIRCHER, CJ ;

MATTHEWS, JW .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :223-234

[2] INVESTIGATION OF THERMAL CYCLING OF PB-ALLOY JOSEPHSON TUNNELING GATES [J].

BASAVAIAH, S ;

GREINER, JH .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (11) :4630-4633

[3]

BASAVAIAH S, 1978, J PHYS PARIS SC6, V39, P1247

[4] HILLOCK GROWTH IN THIN-FILMS [J].

CHAUDHAR.P .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (10) :4339-4346

[5] MECHANISMS OF STRESS RELIEF IN POLYCRYSTALLINE FILMS [J].

CHAUDHARI, P .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1969, 13 (02) :197-+

[6]

Gjostein N. A., 1973, DIFFUSION, P241

[7] FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].

GREINER, JH ;

KIRCHER, CJ ;

KLEPNER, SP ;

LAHIRI, SK ;

WARNECKE, AJ ;

BASAVAIAH, S ;

YEN, ET ;

BAKER, JM ;

BROSIOUS, PR ;

HUANG, HCW ;

MURAKAMI, M ;

AMES, I .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205

[8] GRAIN-BOUNDARY SELF-DIFFUSION IN PB [J].

GUPTA, D ;

KIM, KK .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (04) :2066-2069

[9]

GUPTA D, 1986, P INT S INTERFACE MI, P51

[10] STRESS IN FILMS OF SILICON MONOXIDE [J].

HILL, AE ;

HOFFMAN, GR .

BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (01) :13-&

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