SIMILARITIES IN CHEMICAL INTERMIXING AT THE CU/INP AND CU/SI INTERFACES

被引：30

作者：

KENDELEWICZ, T

ROSSI, G

PETRO, WG

BABALOLA, IA

LINDAU, I

SPICER, WE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 03期

关键词：

D O I：

10.1116/1.582599

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：564 / 569

页数：6

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