CHEMICAL VAPOR-DEPOSITION OF RUTILE FILMS

[11] MECHANISM OF HETEROGENEOUS DEPOSITION OF THIN FILM RUTILE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 529 - +

[12] Harbison D. R., 1969, Thin film dielectrics, P254

[13] HASS G, 1952, VACUUM, V2, P331

[14] HEAVENS OS, 1960, REP PROG PHYS, V23, P1

[15] OXIDE FILMS FORMED ON TITANIUM, ZIRCONIUM, AND THEIR ALLOYS WITH NICKEL, COPPER, AND COBALT [J]. ANALYTICAL CHEMISTRY, 1948, 20 (02) : 158 - 165

[16] SPUTTERED TITANIUM OXIDE FILMS FOR MICROCIRCUIT APPLICATIONS [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 14 - &

[17] LAUDIZE RA, 1970, GROWTH SINGLE CRYSTA, P73

[18] LEPIE MP, 1966, T697 RAYTH CO TECH M

[19] MELLOR JW, 1930, COMPREHENSIVE TREATI, V7, P80

[20] CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE .1. PREPARATION AND SOME PROPERTIES [J]. JOURNAL OF MATERIALS SCIENCE, 1976, 11 (04) : 593 - 603

[11] MECHANISM OF HETEROGENEOUS DEPOSITION OF THIN FILM RUTILE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 529 - +

[12] Harbison D. R., 1969, Thin film dielectrics, P254

[13] HASS G, 1952, VACUUM, V2, P331

[14] HEAVENS OS, 1960, REP PROG PHYS, V23, P1

[15] OXIDE FILMS FORMED ON TITANIUM, ZIRCONIUM, AND THEIR ALLOYS WITH NICKEL, COPPER, AND COBALT [J]. ANALYTICAL CHEMISTRY, 1948, 20 (02) : 158 - 165

[16] SPUTTERED TITANIUM OXIDE FILMS FOR MICROCIRCUIT APPLICATIONS [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 14 - &

[17] LAUDIZE RA, 1970, GROWTH SINGLE CRYSTA, P73

[18] LEPIE MP, 1966, T697 RAYTH CO TECH M

[19] MELLOR JW, 1930, COMPREHENSIVE TREATI, V7, P80

[20] CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE .1. PREPARATION AND SOME PROPERTIES [J]. JOURNAL OF MATERIALS SCIENCE, 1976, 11 (04) : 593 - 603