SUBSTRATE TREATMENT AND FILM DEPOSITION IN IONIZED AND ACTIVATED GAS

被引：23

作者：

HOLLAND, L ^{[1
]}

机构：

[1] UNIV SUSSEX,SCH MATH & PHYS SCI,FALMER,SUSSEX,ENGLAND

来源：

关键词：

D O I：

10.1016/0040-6090(75)90026-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：185 / 203

页数：19

共 45 条

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