OPTICAL-PROPERTIES OF ION ASSISTED DEPOSITED ZIRCONIA THIN-FILMS

被引:27
作者
KRISHNA, MG
RAO, KN
MOHAN, S
机构
[1] Instrumentation and Services Unit, Indian Institute of Science, Bangalore
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.577801
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The nature of the dependence of refractive index, extinction coefficient, and packing density of zirconia films prepared by ion assisted deposition on the energy and current density of ions has been investigated. A broad beam Kaufman ion source has been used to generate oxygen ions in the energy range 100-700 eV and current densities up to 220 muA/cm2. It has been found that the refractive index increases steadily up to an energy of 500 eV beyond which there is a nominal decrease. The highest index obtained was 2.21 at an energy of 500 eV and a current density of 220 muA/cm2. Similarly, with an increase in the current density the refractive index increases initially and seems to saturate beyond a certain critical value dependent on the ion energy. The extinction coefficient was low up to an energy of 300 eV showing a marked increase thereafter. The extinction coefficient was also found to increase at high ion current densities and energies. A critical ion energy and current density beyond which the refractive index as well as the extinction coefficient of these films start deteriorating has been observed.
引用
收藏
页码:3451 / 3455
页数:5
相关论文
共 27 条
  • [1] CONTAMINATION ANALYSIS OF TIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION
    ALJUMAILY, GA
    WILSON, SR
    BARRON, AC
    MCNEIL, JR
    DOYLE, BL
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 906 - 909
  • [2] Apparao K. V. S. R., 1986, Indian Journal of Physics, Part A, V60A, P216
  • [3] THE FORM BIREFRINGENCE OF MACROMOLECULES
    BRAGG, WL
    PIPPARD, AB
    [J]. ACTA CRYSTALLOGRAPHICA, 1953, 6 (11-1): : 865 - 867
  • [4] INVESTIGATION OF THE EVAPORATION PROCESS CONDITIONS ON THE OPTICAL-CONSTANTS OF ZIRCONIA FILMS
    DOBROWOLSKI, JA
    GRANT, PD
    SIMPSON, R
    WALDORF, AJ
    [J]. APPLIED OPTICS, 1989, 28 (18): : 3997 - 4005
  • [5] GIBSON UJ, 1987, PHYS THIN FILMS, V13, P109
  • [6] MODIFICATION OF THIN-FILM PROPERTIES BY ION-BOMBARDMENT DURING DEPOSITION
    HARPER, JME
    CUOMO, JJ
    GAMBINO, RJ
    KAUFMAN, HR
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 886 - 892
  • [7] RELATIONSHIP BETWEEN OPTICAL INHOMOGENEITY AND FILM STRUCTURE
    HARRIS, M
    MACLEOD, HA
    OGURA, S
    PELLETIER, E
    VIDAL, B
    [J]. THIN SOLID FILMS, 1979, 57 (01) : 173 - 178
  • [8] HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE
    JONES, F
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3088 - 3097
  • [9] Klechkovskaya V. V., 1980, Soviet Physics - Crystallography, V25, P636
  • [10] OPTICAL AND CRYSTALLINE INHOMOGENEITY IN EVAPORATED ZIRCONIA FILMS
    KLINGER, RE
    CARNIGLIA, CK
    [J]. APPLIED OPTICS, 1985, 24 (19): : 3184 - 3187