SECONDARY IMPLANTATION OF SB INTO SI MOLECULAR-BEAM EPITAXY LAYERS

被引：83

作者：

JORKE, H

HERZOG, HJ

KIBBEL, H

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 05期

关键词：

D O I：

10.1063/1.96109

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：511 / 513

页数：3

共 22 条

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