NEW METALLOORGANIC PRECURSORS FOR SURFACE PROCESSING

被引：6

作者：

BRADLEY, DC

机构：

[1] Department of Chemistry, Queen Mary and Westfield College, London, E1 4NS, Mile End Road

来源：

APPLIED SURFACE SCIENCE | 1990年 / 46卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(90)90111-C

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Metallo-organic compounds have been used for the deposition, by thermolysis or photolysis, of a wide range of inorganic materials as films on a variety of surfaces. This paper reviews recent work on metallo-organic precursors for the deposition of films of metals, metal oxides, metal nitrides, metal fluorides and compound semiconductors. © 1990.

引用

页码：1 / 4

页数：4

共 32 条

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