CHARACTERIZATION OF A NEWLY DEVELOPED CONTRAST ENHANCEMENT MATERIAL FOR G-LINE EXPOSURE

被引：5

作者：

NAKASE, M

NIKI, H

SATOH, T

KUMAGAE, A

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 02期

关键词：

D O I：

10.1143/JJAP.26.293

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：293 / 297

页数：5

共 5 条

[1] CHARACTERIZATION OF POSITIVE PHOTORESIST [J].

DILL, FH ;

HORNBERGER, WP ;

HAUGE, PS ;

SHAW, JM .

[2]

Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14

[3] CONTRAST ENHANCED PHOTORESISTS - PROCESSING AND MODELING [J].

GRIFFING, BF ;

WEST, PR .

[4]

NIKI H, 1985, 17TH C SOL STAT DEV, P361

OLDHAM, WG ;

NANDGAONKAR, SN ;

NEUREUTHER, AR ;

OTOOLE, M .