PROTON-INDUCED DISPLACEMENT DAMAGE DISTRIBUTIONS AND EXTREMES IN SILICON MICROVOLUMES

被引:59
作者
MARSHALL, PW
DALE, CJ
BURKE, EA
机构
[1] SACHS FREEMAN ASSOCIATES INC,LANDOVER,MD 20785
[2] SPIRE CORP,BEDFORD,MA 01730
关键词
D O I
10.1109/23.101191
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents an analytic approach for determining the pixel-to-pixel distribution of particle-induced damage and damage extremes in microvolumes representative of focal plane array pixel geometries. Comparisons between predicted and measured dark current distributions in a silicon charge injection device (CID) show excellent agreement for 12 and 63 MeV proton-induced damage. The calculated and measured damage extremes are compared using extreme value statistical analysis. The calculations reveal how high energy recoils from proton-induced nuclear reactions strongly influence the pixel-to-pixel variation in damage as well as the damage extremes. This analysis provides a valuable tool for assessing the radiation response of a given imager in a particular environment, and its flexibility enables design-phase evaluation of the radiation response for different pixel geometries and materials in a variety of environments. A comparison between Si and GaAs pixels with equal volumes and equal 12 MeV proton fluences indicates both the average damage and its variance are significantly greater in GaAs. © 1990 IEEE
引用
收藏
页码:1776 / 1783
页数:8
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