EVALUATION OF CRYSTALLINE QUALITY OF ZIRCONIUM DIOXIDE FILMS ON SILICON BY MEANS OF ION-BEAM CHANNELING

被引：12

作者：

OSAKA, Y

IMURA, T

NISHIBAYASHI, Y

NISHIYAMA, F

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 02期

关键词：

D O I：

10.1063/1.340093

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：581 / 582

页数：2

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