ION-BOMBARDMENT ENHANCED ETCHING FOR BI-CA-SR-CU-O HIGH-TC SUPERCONDUCTING THIN-FILMS

被引:3
作者
FUJIWARA, S
YUASA, R
SHIKICHI, K
MATSUTA, Y
NAKAO, M
SUZUKI, S
机构
[1] Tsukuba Research Center, SANYO Electric Co. Ltd., Ibaraki
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 10期
关键词
Alkaline solutions; Bi-Ca-Sr-Cu-0; system; Focused ion beam; Iigh- Tc superconducting thin film; Ion bombardment enhanced etching; Microfabrication;
D O I
10.1143/JJAP.29.2307
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ion bombardment enhanced etching (IBEE) has been first applied to Bi-Ca-Sr-Cu-O (BCSCO) high-Tcsuperconducting thin films. It was found out that the damaged region formed by the ion irradiation with a 200 keV Si++focused ion beam was selectively dissolved in 1 normal KOH solution. The IBEE process resolves 0.1 µm patterns in the BCSCO films. Other strong alkaline solutions such as NaOH solution were also effective for the selective etching of the BCSCO films, but acid solutions did not give an enhanced etch rate at the irradiated region. The KOH treatment gave no effect on Tcof the BCSCO film. Bridge structures with the width of 1.5 µm were successfully fabricated with little degradation in Tc. © 1990 IOP Publishing Ltd.
引用
收藏
页码:2307 / 2311
页数:5
相关论文
共 12 条
[1]   SUPERCONDUCTIVITY IN 2-MU-M WIDE STRIP LINE OF GD-BA-CU-O THIN-FILM FABRICATED BY LOW-TEMPERATURE PROCESSES [J].
ENOKIHARA, A ;
HIGASHINO, H ;
SETSUNE, K ;
MITSUYU, T ;
WASA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (08) :L1521-L1523
[2]  
FUJIWARA S, 1989, 2ND INT S SUP TSUK
[3]   HIGH-RESOLUTION PATTERNING OF HIGH-TC SUPERCONDUCTORS [J].
HARRIOTT, LR ;
POLAKOS, PA ;
RICE, CE .
APPLIED PHYSICS LETTERS, 1989, 55 (05) :495-497
[4]   MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS [J].
KOMURO, M ;
HIROSHIMA, H ;
TANOUE, H ;
KANAYAMA, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :985-989
[5]   FOCUSED ION-BEAM PROCESSES FOR HIGH-TC SUPERCONDUCTORS [J].
MATSUI, S ;
OCHIAI, Y ;
KOJIMA, Y ;
TSUGE, H ;
TAKADO, N ;
ASAKAWA, K ;
MATSUTERA, H ;
FUJITA, J ;
YOSHITAKE, T ;
KUBO, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03) :900-905
[6]   MAGNETRON SPUTTERING OF BI-CA-SR-CU-O THIN-FILMS WITH SUPERCONDUCTIVITY ABOVE 80-K [J].
NAKAO, M ;
KUWAHARA, H ;
YUASA, R ;
MUKAIDA, H ;
MIZUKAMI, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (03) :L378-L380
[7]   CHEMICAL ETCHING OF Y-CU-BA-O THIN-FILMS [J].
SHIH, I ;
QIU, CX .
APPLIED PHYSICS LETTERS, 1988, 52 (18) :1523-1524
[8]   WET CHEMICAL ETCHING OF HIGH-TEMPERATURE SUPERCONDUCTING Y-BA-CU-O FILMS IN ETHYLENEDIAMINETETRAACETIC ACID [J].
SHOKOOHI, FK ;
SCHIAVONE, LM ;
ROGERS, CT ;
INAM, A ;
WU, XD ;
NAZAR, L ;
VENKATESAN, T .
APPLIED PHYSICS LETTERS, 1989, 55 (25) :2661-2663
[9]   CHEMICAL ETCHING OF HIGH-TC SUPERCONDUCTING FILMS IN FELIOX-115 SOLUTION [J].
TONOUCHI, M ;
SAKAGUCHI, Y ;
KOBAYASHI, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (01) :L98-L100
[10]   SUPERCONDUCTING LINES FABRICATED FROM EPITAXIAL Y-BA-CU-O FILMS [J].
TSUGE, H ;
MATSUI, S ;
MATSUKURA, N ;
KOJIMA, Y ;
WADA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11) :L2237-L2239