STRONTIUM-TITANATE THIN-FILMS BY RAPID THERMAL-PROCESSING

被引:49
作者
JOSHI, PC
KRUPANIDHI, SB
机构
[1] Materials Research Laboratory, Pennsylvania State University, University Park
关键词
D O I
10.1063/1.107536
中图分类号
O59 [应用物理学];
学科分类号
摘要
SrTiO3 thin films having perovskite structure were fabricated by sol-gel technique with a post-deposition rapid thermal annealing treatment at 550-degrees-C for 60 s. The films exhibited good structural, dielectric, and insulating properties. The measured dielectric constant and loss factor at 100 kHz were 225 and 0.008, respectively. Unit area capacitance of 3.5 fF/mum2 and leakage current density of less than 10(-8) A/cm2 were obtained for 500-800 nm thick films. A charge storage density of 18.3 fC/mum2 was obtained at an applied electric field of 100 kV/cm. The resistivity of these films was in the range of 10(10)-10(13) OMEGA cm. The C-V measurements on films in metal-insulator-semiconductor (MIS) configuration indicated good Si/SrTiO3 interface characteristics.
引用
收藏
页码:1525 / 1527
页数:3
相关论文
共 10 条
  • [1] ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF STRONTIUM-TITANATE
    FEIL, WA
    WESSELS, BW
    TONGE, LM
    MARKS, TJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) : 3858 - 3861
  • [2] ELECTRICAL-CONDUCTIVITY OF SPUTTERED FILMS OF STRONTIUM-TITANATE
    GERBLINGER, J
    MEIXNER, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (12) : 7453 - 7459
  • [3] PREPARATION OF BATIO3 AND SRTIO3 POLYCRYSTALLINE THIN-FILMS ON FLEXIBLE POLYMER FILM SUBSTRATE BY HYDROTHERMAL METHOD
    ISHIZAWA, N
    BANNO, H
    HAYASHI, M
    YOO, SE
    YOSHIMURA, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (11): : 2467 - 2472
  • [4] MATSUBARA S, 1990, MATER RES SOC SYMP P, V200, P243, DOI 10.1557/PROC-200-243
  • [5] EXCIMER LASER ABLATED STRONTIUM-TITANATE THIN-FILMS FOR DYNAMIC RANDOM-ACCESS MEMORY APPLICATIONS
    ROY, D
    PENG, CJ
    KRUPANIDHI, SB
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (20) : 2478 - 2480
  • [6] SHI L, 1992, INTEGR FERROELECTR, V1, P111
  • [7] ELECTRODE-LIMITED TO BULK-LIMITED CONDUCTION IN SILICON OXIDE FILMS
    STUART, M
    [J]. PHYSICA STATUS SOLIDI, 1967, 23 (02): : 595 - &
  • [8] SZE SM, 1985, SEMICONDUCTOR DEVICE, P192
  • [9] Wolf H. F, 1969, SILICON SEMICONDUCTO
  • [10] SRTIO3 THIN-FILM PREPARATION BY ION-BEAM SPUTTERING AND ITS DIELECTRIC-PROPERTIES
    YAMAMICHI, S
    SAKUMA, T
    TAKEMURA, K
    MIYASAKA, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9B): : 2193 - 2196