MO-SI MULTILAYER AS SOFT-X-RAY MIRRORS FOR THE WAVELENGTHS AROUND 20 NM REGION

被引：8

作者：

KIM, D

LEE, HW

LEE, JJ

JE, JH

SAKURAI, M

WATANABE, M

机构：

[1] POHANG UNIV SCI & TECHNOL,DEPT MAT SCI & ENGN,KYUNGBUK 790600,SOUTH KOREA

[2] KOBE UNIV,DEPT PHYS,KOBE 657,JAPAN

[3] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.578911

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Molybdenum-silicon multilayer soft x-ray mirrors have been fabricated using a magnetron sputtering system. Their structures have been characterized by x-ray diffraction and reflectivities at normal incidence have been measured by using monochromatized synchrotron radiation in the 18-24 nm region. A normal incidence reflectivity as high as 40% at 20.8 nm was achieved.

引用

页码：148 / 152

页数：5

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