FLUID-DYNAMICS AND DUST GROWTH IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

被引：14

作者：

HAALAND, P

IBRANI, S

JIANG, H

机构：

[1] ANALATOM INC,SUNNYVALE,CA 94089

[2] WRIGHT LAB,ELECTROMAGNET MAT GRP,WRIGHT PATTERSON AFB,OH 45433

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 13期

关键词：

D O I：

10.1063/1.111860

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A paradox arises with the observation of large dust particles in a low-pressure plasma enhanced chemical vapor deposition reactor. Neutral drag forces in an axisymmetric flowing afterglow reactor permit micrometer sized dust grains to form by trapping them for long times in regions with high concentrations of film precursors. A summary of the relevant mechanical and electrostatic forces on dust grains shows that collisions with neutral gas reconcile the growth rate, residence times, and relatively large diameters of the observed dust particles.

引用

页码：1629 / 1631

页数：3

共 14 条

[1] TRANSPORT OF DUST PARTICLES IN GLOW-DISCHARGE PLASMAS [J].