DETECTION OF ALIGNMENT SIGNALS FOR FOCUSED ION-BEAM LITHOGRAPHY

被引：6

作者：

MORIMOTO, H

SASAKI, Y

ONODA, H

KATO, T

机构：

来源：

关键词：

D O I：

10.1063/1.95880

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：898 / 900

页数：3

共 6 条

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KATO, T
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (10) : 1403 - 1407
[2] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
KATO, T
WATAKABE, Y
NAKATA, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1279 - 1285
[3] MIYAUCHI E, 1983, JPN J APPL PHYS 2, V22, pL225
[4] MORIMOTO H, 1983, 1983 P INT ION ENG C, P777
[5] 100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION
SHIOKAWA, T
KIM, PH
TOYODA, K
NAMBA, S
MATSUI, T
GAMO, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1117 - 1120
[6] WELLS OC, 1974, SCANNING ELECTRON MI, P63