MARK DETECTION TECHNOLOGY IN ELECTRON-BEAM DIRECT WRITING

被引：5

作者：

KASHIWAKI, T ^{[1
]}

MORIMOTO, H ^{[1
]}

TAKEUCHI, S ^{[1
]}

SAITOH, K ^{[1
]}

WATAKABE, Y ^{[1
]}

KATO, T ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP,LSI RES & DEV LAB,ITAMI,HYOGO 664,JAPAN

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1984年 / 31卷 / 10期

关键词：

D O I：

10.1109/T-ED.1984.21724

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1403 / 1407

页数：5

相关论文

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