ALIGNMENT SIGNALS FROM SILICON TAPERED STEPS FOR ELECTRON-BEAM LITHOGRAPHY

被引：10

作者：

LIN, YC

NEUREUTHER, AR

ADESIDA, I

机构：

[1] UNIV CALIF BERKELEY, DEPT ELECT ENGN & COMP SCI, BERKELEY, CA 94720 USA

[2] UNIV CALIF BERKELEY, ELECTR RES LAB, BERKELEY, CA 94720 USA

来源：

关键词：

D O I：

10.1063/1.330558

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：899 / 911

页数：13

共 60 条

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