学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
LOW-TEMPERATURE OXIDATION OF SILICON STUDIED BY PHOTOSENSITIVE ESR AND AUGER-ELECTRON SPECTROSCOPY
被引:21
作者
:
RUZYLLO, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
RUZYLLO, J
[
1
]
SHIOTA, I
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
SHIOTA, I
[
1
]
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
MIYAMOTO, N
[
1
]
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
NISHIZAWA, J
[
1
]
机构
:
[1]
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1976年
/ 123卷
/ 01期
关键词
:
D O I
:
10.1149/1.2132758
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:26 / 29
页数:4
相关论文
共 9 条
[1]
SPIN-DEPENDENT RECOMBINATION ON SILICON SURFACE
LEPINE, DJ
论文数:
0
引用数:
0
h-index:
0
LEPINE, DJ
[J].
PHYSICAL REVIEW B,
1972,
6
(02):
: 436
-
&
[2]
Little L.H., 1966, INFRARED SPECTRA ADS
[3]
STUDY OF SILICON-SILICON DIOXIDE STRUCTURE BY ELECTRON-SPIN RESONANCE .2.
NISHI, Y
论文数:
0
引用数:
0
h-index:
0
NISHI, Y
OHWADA, A
论文数:
0
引用数:
0
h-index:
0
OHWADA, A
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
TANAKA, K
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1972,
11
(01)
: 85
-
&
[4]
STUDY OF SILICON-SILICON DIOXIDE STRUCTURE BY ELECTRON SPIN RESONANCE .1.
NISHI, Y
论文数:
0
引用数:
0
h-index:
0
NISHI, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1971,
10
(01)
: 52
-
+
[5]
ELECTRON PARAMAGNETIC RESONANCE INVESTIGATION OF SI-SIO2 INTERFACE
REVESZ, AG
论文数:
0
引用数:
0
h-index:
0
机构:
RCA Laboratories, David Sarnoff Research Center, Princeton
REVESZ, AG
GOLDSTEIN, B
论文数:
0
引用数:
0
h-index:
0
机构:
RCA Laboratories, David Sarnoff Research Center, Princeton
GOLDSTEIN, B
[J].
SURFACE SCIENCE,
1969,
14
(02)
: 361
-
+
[6]
INVESTIGATION OF PASSIVATION MECHANISM IN SILICON SURFACES BY ELECTRON-SPIN RESONANCE
SHIOTA, I
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
SHIOTA, I
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
MIYAMOTO, N
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
NISHIZAWA, J
[J].
SURFACE SCIENCE,
1973,
36
(02)
: 414
-
429
[7]
SHIOTA I, 1974, JPN J APPL PHYS, P417
[8]
[No title captured]
[9]
[No title captured]
←
1
→
共 9 条
[1]
SPIN-DEPENDENT RECOMBINATION ON SILICON SURFACE
LEPINE, DJ
论文数:
0
引用数:
0
h-index:
0
LEPINE, DJ
[J].
PHYSICAL REVIEW B,
1972,
6
(02):
: 436
-
&
[2]
Little L.H., 1966, INFRARED SPECTRA ADS
[3]
STUDY OF SILICON-SILICON DIOXIDE STRUCTURE BY ELECTRON-SPIN RESONANCE .2.
NISHI, Y
论文数:
0
引用数:
0
h-index:
0
NISHI, Y
OHWADA, A
论文数:
0
引用数:
0
h-index:
0
OHWADA, A
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
TANAKA, K
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1972,
11
(01)
: 85
-
&
[4]
STUDY OF SILICON-SILICON DIOXIDE STRUCTURE BY ELECTRON SPIN RESONANCE .1.
NISHI, Y
论文数:
0
引用数:
0
h-index:
0
NISHI, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1971,
10
(01)
: 52
-
+
[5]
ELECTRON PARAMAGNETIC RESONANCE INVESTIGATION OF SI-SIO2 INTERFACE
REVESZ, AG
论文数:
0
引用数:
0
h-index:
0
机构:
RCA Laboratories, David Sarnoff Research Center, Princeton
REVESZ, AG
GOLDSTEIN, B
论文数:
0
引用数:
0
h-index:
0
机构:
RCA Laboratories, David Sarnoff Research Center, Princeton
GOLDSTEIN, B
[J].
SURFACE SCIENCE,
1969,
14
(02)
: 361
-
+
[6]
INVESTIGATION OF PASSIVATION MECHANISM IN SILICON SURFACES BY ELECTRON-SPIN RESONANCE
SHIOTA, I
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
SHIOTA, I
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
MIYAMOTO, N
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
TOHOKU UNIV, RES INST ELECT COMMUN, SENDAI, JAPAN
NISHIZAWA, J
[J].
SURFACE SCIENCE,
1973,
36
(02)
: 414
-
429
[7]
SHIOTA I, 1974, JPN J APPL PHYS, P417
[8]
[No title captured]
[9]
[No title captured]
←
1
→