NATIVE-OXIDE DEFINED IN0.5(ALXGA1-X)0.5P QUANTUM-WELL HETEROSTRUCTURE WINDOW LASERS (660 NM)

被引:16
作者
MARANOWSKI, SA
KISH, FA
CARACCI, SJ
HOLONYAK, N
DALLESASSE, JM
BOUR, DP
TREAT, DW
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
[2] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
关键词
D O I
10.1063/1.108452
中图分类号
O59 [应用物理学];
学科分类号
摘要
Data are presented demonstrating In0.5(AlxGa1-x)0.5P quantum well heterostructure lasers with extended current-blocking windows (approximately 75 mum/window) that exhibit significant improvements in output power (approximately 2 X) compared to lasers with no windows. The windows and active stripes are defined by the formation of a thin (approximately 1000 angstrom, patterned) native oxide via H2O vapor oxidation (550-degrees-C) of the high-gap In0.5(AlxGa1-x)0.5P upper confining layer. Devices operating at approximately 660 nm with a 40 mum wide emitting aperture (approximately 500 mum cavity) and approximately 75 mum windows (total window length approximately 150 mum) exhibit 300 K continuous output powers > 130 mW/facet (uncoated) and pulsed output powers > 575 mW/facet (uncoated). Improvements in output power result from decreased heating at the facets and defocusing of the optical wave in the unpumped window regions.
引用
收藏
页码:1688 / 1690
页数:3
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