DOPING OF MICROCRYSTALLINE SI-H,CL FILMS IN RF GLOW-DISCHARGE

被引:11
作者
BRUNO, G
CAPEZZUTO, P
CRAMAROSSA, F
BARBAROSSA, V
AUGELLI, V
MURRI, R
机构
[1] UNIV BARI,CNR,CTR STUDIO CHIM PLASMI,I-70126 BARI,ITALY
[2] UNIV BARI,DEPARTIMENTO FIS,I-70126 BARI,ITALY
[3] UNIV BARI,GRP NAZL STRUTTURA MAT,I-70126 BARI,ITALY
关键词
D O I
10.1016/0022-3093(83)90295-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:815 / 818
页数:4
相关论文
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