BALLISTIC ELECTRON-TRANSPORT AND 2-LEVEL RESISTANCE FLUCTUATIONS IN NOBLE-METAL NANOBRIDGES

被引:71
作者
HOLWEG, PAM
CARO, J
VERBRUGGEN, AH
RADELAAR, S
机构
[1] Delft Institute of Microelectronics and Submicron Technology, Delft University of Technology, 2628 CJ Delft
来源
PHYSICAL REVIEW B | 1992年 / 45卷 / 16期
关键词
D O I
10.1103/PhysRevB.45.9311
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical properties of microfabricated nanobridges of copper, silver, and gold with contact diameters in the range 4-32 nm have been studied. High-quality point-contact spectra are evidence that electron transport is ballistic in these nanobridges. A comparison of our spectra with spectra from mechanical point contacts shows that microfabricated nanobridges are at least as good as mechanical point contacts for study of the electron-phonon interaction. Further, in Au nanobridges we have observed defect motion induced two-level resistance fluctuations (TLF's). An expression is derived for the voltage dependence of the temperature T(d) of a defect in a nanobridge at low lattice temperatures. Using this expression for T(d), the experimental voltage dependence of the TLF's is successfully described by a thermal-activation model for the fluctuation rates, in which the voltage dependence of the activation energy and defect temperature is included. The values for the attempt time, activation energy, and electromigration parameter are as expected for defects in metals. An analysis of the two TLF's studied, showing a striking difference in both voltage dependence and magnitude of the duty cycle, suggests that rearrangement of complex defects is the mechanism behind the TLF behavior.
引用
收藏
页码:9311 / 9319
页数:9
相关论文
共 23 条
  • [11] MARSHALL W, 1971, THEORY THERMAL NEUTR, P57
  • [12] DEPENDENCE OF 1/F NOISE ON DEFECTS INDUCED IN COPPER-FILMS BY ELECTRON-IRRADIATION
    PELZ, J
    CLARKE, J
    [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (07) : 738 - 741
  • [13] QUANTITATIVE LOCAL-INTERFERENCE MODEL FOR 1/F NOISE IN METAL-FILMS
    PELZ, J
    CLARKE, J
    [J]. PHYSICAL REVIEW B, 1987, 36 (08): : 4479 - 4482
  • [14] DEFECT INTERACTIONS AND NOISE IN METALLIC NANOCONSTRICTIONS
    RALLS, KS
    BUHRMAN, RA
    [J]. PHYSICAL REVIEW LETTERS, 1988, 60 (23) : 2434 - 2437
  • [15] INDIVIDUAL-DEFECT ELECTROMIGRATION IN METAL NANOBRIDGES
    RALLS, KS
    RALPH, DC
    BUHRMAN, RA
    [J]. PHYSICAL REVIEW B, 1989, 40 (17): : 11561 - 11570
  • [16] MICROSCOPIC STUDY OF 1/F NOISE IN METAL NANOBRIDGES
    RALLS, KS
    BUHRMAN, RA
    [J]. PHYSICAL REVIEW B, 1991, 44 (11): : 5800 - 5817
  • [17] FABRICATION OF THIN-FILM METAL NANOBRIDGES
    RALLS, KS
    BUHRMAN, RA
    TIBERIO, RC
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (23) : 2459 - 2461
  • [18] 1/F NOISE OF METALS - A CASE FOR EXTRINSIC ORIGIN
    SCOFIELD, JH
    MANTESE, JV
    WEBB, WW
    [J]. PHYSICAL REVIEW B, 1985, 32 (02): : 736 - 742
  • [19] ELECTROMIGRATION AND THE LOCAL TRANSPORT FIELD IN MESOSCOPIC SYSTEMS
    SORBELLO, RS
    [J]. PHYSICAL REVIEW B, 1989, 39 (08): : 4984 - 4996
  • [20] FUNDAMENTAL QUESTIONS IN THE THEORY OF ELECTROMIGRATION
    VERBRUGGEN, AH
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (01) : 93 - 98