THE INFLUENCE OF SUBSTRATE-TEMPERATURE AND SPUTTERING GAS ATMOSPHERE ON THE ELECTRICAL-PROPERTIES OF REACTIVELY SPUTTERED INDIUM TIN OXIDE-FILMS

被引:21
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NISHIKAWA, S
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10.1016/0040-6090(86)90129-X
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T [工业技术];
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08 ;
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页码:219 / 228
页数:10
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