THE INFLUENCE OF SUBSTRATE-TEMPERATURE AND SPUTTERING GAS ATMOSPHERE ON THE ELECTRICAL-PROPERTIES OF REACTIVELY SPUTTERED INDIUM TIN OXIDE-FILMS

被引：21

作者：

NISHIKAWA, S

机构：

来源：

THIN SOLID FILMS | 1986年 / 135卷 / 02期

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D O I：

10.1016/0040-6090(86)90129-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

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页码：219 / 228

页数：10

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共 11 条

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[9] RIDGE MI, 1983, 1983 P INT ION ENG C, V2, P1011
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[J]. THIN SOLID FILMS, 1980, 72 (03) : 469 - 474