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NATURE AND DISTRIBUTION OF RADICALS IN RF AND DC SILANE DISCHARGES - EFFECTS ON DEPOSITION RATE AND PHYSICAL-PROPERTIES OF A-SI-H

被引：5
作者：
JANSEN, F
MORT, J
MORGAN, M
机构：
来源：
CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE | 1985年 / 63卷 / 01期
关键词：
D O I：
10.1139/v85-034
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：217 / 220
页数：4
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[5]   MASS-SPECTROMETRY OF A SILANE GLOW-DISCHARGE DURING PLASMA DEPOSITION OF A-SI-H FILMS [J].
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