PREPARATION OF PLATINUM SILICIDES BY REACTIVE SPUTTERING OF PT IN SIH4 PLASMA

被引:4
作者
BUDHANI, RC
OBRIEN, BP
DOERR, HJ
DESHPANDEY, CV
BUNSHAH, RF
机构
关键词
D O I
10.1063/1.334824
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:5477 / 5482
页数:6
相关论文
共 8 条
[1]   FORMATION OF SHALLOW SCHOTTKY CONTACTS TO SI USING PT-SI AND PD-SI ALLOY-FILMS [J].
EIZENBERG, M ;
FOELL, H ;
TU, KN .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) :861-868
[2]  
GHATE PB, 1982, THIN SOLID FILMS, V93, P359, DOI 10.1016/0040-6090(82)90143-2
[3]  
HODGMAN CD, 1961, HDB PHYSICS CHEM, P2927
[4]   HIGH-TEMPERATURE STABILITY OF PTSI FORMED BY REACTION OF METAL WITH SILICON OR BY COSPUTTERING [J].
MURARKA, SP ;
KINSBRON, E ;
FRASER, DB ;
ANDREWS, JM ;
LLOYD, EJ .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :6943-6951
[5]  
MURARKA SP, 1983, SILICIDES VLSI APPLI
[6]  
PEARSE RWB, 1976, IDENTIFICATION MOL S, P316
[7]   KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].
POATE, JM ;
TISONE, TC .
APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393
[8]  
SHUNK GFA, 1969, CONSTITUTION BINARY, P623