HIGH-TEMPERATURE STABILITY OF PTSI FORMED BY REACTION OF METAL WITH SILICON OR BY COSPUTTERING

被引:42
作者
MURARKA, SP
KINSBRON, E
FRASER, DB
ANDREWS, JM
LLOYD, EJ
机构
关键词
D O I
10.1063/1.332010
中图分类号
O59 [应用物理学];
学科分类号
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页码:6943 / 6951
页数:9
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