A MODEL OF GROWTH-RATE NONUNIFORMITY IN THE SIMULTANEOUS DEPOSITION AND DOPING OF A POLYCRYSTALLINE SILICON FILM BY LPCVD

被引：21

作者：

YECKEL, A

MIDDLEMAN, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 05期

关键词：

D O I：

10.1149/1.2100657

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1275 / 1281

页数：7

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