THIN-FILMS PREPARED BY SPUTTERING MGF2 IN AN RF PLANAR MAGNETRON

被引：27

作者：

MARTINU, L ^{[1
]}

BIEDERMAN, H ^{[1
]}

HOLLAND, L ^{[1
]}

机构：

[1] UNIV SUSSEX, SCH MATH & PHYS SCI, BRIGHTON BN1 9QH, E SUSSEX, ENGLAND

来源：

VACUUM | 1985年 / 35卷 / 12期

关键词：

D O I：

10.1016/0042-207X(85)90310-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：531 / 535

页数：5

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[8] DESIGN AND OPERATING CHARACTERISTICS OF LOW-PRESSURE PLASMA SYSTEMS [J].

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[9]

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