DEVELOPMENT OF THE SELF-ALIGNED TITANIUM SILICIDE PROCESS FOR VLSI APPLICATIONS

被引:61
作者
ALPERIN, ME
HOLLAWAY, TC
HAKEN, RA
GOSMEYER, CD
KARNAUGH, RV
PARMANTIE, WD
机构
[1] TEXAS INSTRUMENTS INC,CTR SEMICOND PROC & DESIGN,BIPOLAR WATER FABRICAT GRP,DALLAS,TX 75265
[2] TEXAS INSTRUMENTS INC,VLSI LAB,DALLAS,TX 75265
[3] TEXAS INSTRUMENTS INC,SEMICOND PROC GRP,DALLAS,TX 75265
关键词
D O I
10.1109/JSSC.1985.1052277
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:61 / 69
页数:9
相关论文
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