STUDY OF THE COMPOSITIONAL CONTROL OF THE ANTIMONIDE ALLOYS INGASB AND GAASSB GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY

被引:16
作者
ITANI, Y
ASAHI, H
KANEKO, T
OKUNO, Y
GONDA, S
机构
[1] Institute of Scientific and Industrial Research, Osaka University, baraki, Osaka 567, 8-1, Mihogaoka
关键词
D O I
10.1063/1.353283
中图分类号
O59 [应用物理学];
学科分类号
摘要
MOMBE (metalorganic molecular beam epitaxy) growth characteristics of Sb containing ternary alloys, InGaSb, and GaAsSb are investigated. In the growth of InGaSb using TEGa (triethylgallium), TMIn (trimethylindium), and Sb4 (elemental antimony), the enhanced desorption of methyl-In molecules at a substrate temperature T(sub) of around 500-degrees-C as well as the enhanced desorption of ethyl-Ga molecules at around 515-degrees-C are observed. They are due to the weak bond strength of antimonide compounds. Furthermore, the decrease of Ga solid composition with increasing Sb4 flux and the increase of GaSb partial growth rate with TMIn flow rate are also observed at as high as 500-degrees-C. This is caused by the fact that the site blocking effect of excess Sb atoms exists up to higher T(sub). In the growth of GaAsSb using TEGa, TEAs (triethylarsine), and TESb (triethylstibine), the Sb composition versus TESb/(TEAs+TESb) curve exhibits a bowing characteristic, which is similar to that in the MOVPE (metalorganic vapor phase epitaxy) growth and is different from that in the MBE (molecular beam epitaxy) growth. Mass transport properties of Sb molecules in the MOMBE are considered to be similar to that in the MOVPE. It is found that the T(sub) dependence of Sb composition is much weaker than that in the MBE, which is a superior point of MOMBE in the growth of antimonide alloys.
引用
收藏
页码:1161 / 1167
页数:7
相关论文
共 28 条
[1]   MOMBE (METALORGANIC MOLECULAR-BEAM EPITAXY) GROWTH OF INGAALASSB SYSTEM ON GASB [J].
ASAHI, H ;
KANEKO, T ;
OKUNO, Y ;
GONDA, S .
JOURNAL OF CRYSTAL GROWTH, 1991, 107 (1-4) :1009-1014
[2]   MOMBE GROWTH-CHARACTERISTICS OF ANTIMONIDE COMPOUNDS [J].
ASAHI, H ;
KANEKO, T ;
OKUNO, Y ;
ITANI, Y ;
ASAMI, K ;
GONDA, S .
JOURNAL OF CRYSTAL GROWTH, 1992, 120 (1-4) :252-260
[3]   GROWTH OF GALNASSB ALLOYS BY MOCVD AND CHARACTERIZATION OF GALNASSB/GASB P-N PHOTODIODES [J].
BOUGNOT, G ;
DELANNOY, F ;
FOUCARAN, A ;
PASCAL, F ;
ROUMANILLE, F ;
GROSSE, P ;
BOUGNOT, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (07) :1783-1788
[4]   2.2-MU-M GAINASSB ALGAASSB INJECTION-LASERS WITH LOW THRESHOLD CURRENT-DENSITY [J].
CANEAU, C ;
ZYSKIND, JL ;
SULHOFF, JW ;
GLOVER, TE ;
CENTANNI, J ;
BURRUS, CA ;
DENTAI, AG ;
POLLACK, MA .
APPLIED PHYSICS LETTERS, 1987, 51 (10) :764-766
[5]   MOLECULAR-BEAM EPITAXY (MBE) OF IN1-XGAXAS AND GASB1-YASY [J].
CHANG, CA ;
LUDEKE, R ;
CHANG, LL ;
ESAKI, L .
APPLIED PHYSICS LETTERS, 1977, 31 (11) :759-761
[6]   MOVPE GROWTH OF GAINASSB [J].
CHERNG, MJ ;
JEN, HR ;
LARSEN, CA ;
STRINGFELLOW, GB ;
LUNDT, H ;
TAYLOR, PC .
JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :408-417
[7]   GROWTH OF INSB AND INAS1-XSBX BY OM-CVD [J].
CHIANG, PK ;
BEDAIR, SM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) :2422-2426
[8]   ELECTRON-TRANSPORT IN AN ALSB/INAS/GASB TUNNEL EMITTER HOT-ELECTRON TRANSISTOR [J].
CHIU, TH ;
LEVI, AFJ .
APPLIED PHYSICS LETTERS, 1989, 55 (18) :1891-1893
[9]   ROOM-TEMPERATURE OPERATION OF INGAASSB/ALGASB DOUBLE HETEROSTRUCTURE LASERS NEAR 2.2 MU-M PREPARED BY MOLECULAR-BEAM EPITAXY [J].
CHIU, TH ;
TSANG, WT ;
DITZENBERGER, JA ;
VANDERZIEL, JP .
APPLIED PHYSICS LETTERS, 1986, 49 (17) :1051-1052
[10]   SURFACE CHEMICAL-KINETICS DURING THE GROWTH OF GAAS BY CHEMICAL BEAM EPITAXY [J].
CHIU, TH ;
CUNNINGHAM, JE ;
ROBERTSON, A .
JOURNAL OF CRYSTAL GROWTH, 1989, 95 (1-4) :136-139