PHOTOTHERMAL EXAMINATION OF THE HEAT DIFFUSION INHOMOGENEITY IN DIAMOND FILMS OF SUBMICRON THICKNESS

被引:31
作者
PLAMANN, K [1 ]
FOURNIER, D [1 ]
ANGER, E [1 ]
GICQUEL, A [1 ]
机构
[1] UNIV PARIS 13,INGN MAT & HAUTES PRESS LAB,F-93430 VILLETANEUSE,FRANCE
关键词
D O I
10.1016/0925-9635(94)90263-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present measurements of the in-plane thermal diffusivity of free-standing diamond films of thicknesses from 0.3 to 6 mum. The photothermal method used for the measurements is non-destructive and contact-free, and does not require any sample preparation. The measured values he in the range of 0.1 to 1.0 cm2 s-1, which is an order of magnitude below typical results obtained on bulk material. The results show a strong dependence of the thermal diffusivity on the film thickness and morphology. Phonon scattering at grain boundaries was identified as the dominating process limiting the heat diffusion. The availability of sets of films with different characteristics allowed the determination of the spatial dependence of the heat diffusivity even in very thin membranes. The observed effects are in good accordance with the extrapolation of measurements previously performed on much thicker samples. The data are correlated to results gained by Raman spectroscopy and spectroscopic ellipsometry.
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页码:752 / 756
页数:5
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