MULTIPLE SPECULAR REFLECTANCE METHOD FOR INFRARED MEASUREMENT OF METALLIC OXIDE THIN FILMS ON METAL SURFACES

被引：5

作者：

POBINER, H

机构：

来源：

ANALYTICAL CHEMISTRY | 1967年 / 39卷 / 01期

关键词：

D O I：

10.1021/ac60245a018

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：90 / &

共 10 条

[1]

BAUMAN RP, 1962, ABSORPTION SPECTROSC, P156

[2] DETERMINATION OF SILICON OXIDE THICKNESS [J].

GOLDSMITH, N ;

MURRAY, LA .

SOLID-STATE ELECTRONICS, 1966, 9 (04) :331-+

[3] IDENTIFICATION OF PIGMENTS IN PAINT PRODUCTS BY INFRARED SPECTROSCOPY [J].

HARKINS, TR ;

HARRIS, JT ;

SHREVE, OD .

ANALYTICAL CHEMISTRY, 1959, 31 (04) :541-545

[4] MULTIPLE REFLECTION CELLS FOR INTERNAL REFLECTION SPECTROMETRY [J].

HARRICK, NJ .

ANALYTICAL CHEMISTRY, 1964, 36 (01) :188-&

[5]

HOLLAND L, 1963, VACUUM DEPOSITION TH, pCH7

[6] KINETICS OF THERMAL GROWTH OF SILICON DIOXIDE FILMS IN WATER VAPOR-OXYGEN-ARGON MIXTURES [J].

NAKAYAMA, T ;

COLLINS, FC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (07) :706-+

[7] OPTICAL THICKNESS MEASUREMENT OF THIN TRANSPARENT FILMS ON SILICON [J].

REIZMAN, F .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3804-&

[8] INTERFERENCE METHOD FOR MEASURING THICKNESS OFEPITAXIALLY GROWN FILMS [J].

SPITZER, WG ;

TANENBAUM, M .

JOURNAL OF APPLIED PHYSICS, 1961, 32 (04) :744-&

[9]

1962, IR8077 BECKM INSTR I

[10]

[No title captured]

← 1 →