RADIATION-INDUCED REACTIONS OF CHLOROMETHYLSTYRENE-BASED RESIST MATERIALS ANALYZED FROM RADIOLYSIS OF LOW-MOLECULAR MODEL COMPOUNDS

被引：11

作者：

TANIGAKI, K ^{[1
]}

SUZUKI, M ^{[1
]}

SAOTOME, Y ^{[1
]}

OHNISHI, Y ^{[1
]}

TATEISHI, K ^{[1
]}

机构：

[1] NEC CORP,RESOURCES & ENVIRONM PROTECT RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 07期

关键词：

D O I：

10.1149/1.2114190

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1678 / 1683

页数：6

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