ELECTRICAL-PROPERTIES OF TIO2 FILMS DEPOSITED BY A REACTIVE-IONIZED CLUSTER BEAM

被引：104

作者：

FUKUSHIMA, K ^{[1
]}

YAMADA, I ^{[1
]}

机构：

[1] KYOTO UNIV,ION BEAM ENGN LAB,SAKYO KU,KYOTO 606,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 02期

关键词：

D O I：

10.1063/1.343093

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：619 / 623

页数：5

共 13 条

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