GALLIUM MIGRATION THROUGH CONTACT METALLIZATIONS ON GAP

被引：7

作者：

BRANTLEY, WA ^{[1
]}

SCHWARTZ, B ^{[1
]}

KERAMIDAS, VG ^{[1
]}

KAMMLOTT, GW ^{[1
]}

SINHA, AK ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 03期

关键词：

D O I：

10.1149/1.2134229

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：434 / 435

页数：2

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