248 NM LASER ETCHING OF GAAS IN CHLORINE AND OZONE GAS ENVIRONMENTS

[1] ASHBY CIH, 1984, APPL PHYS LETT, V45, P892, DOI 10.1063/1.95404

[2] DOPING LEVEL SELECTIVE PHOTOCHEMICAL DRY ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (08) : 752 - 754

[3] EFFECTIVE SATURABLE ABSORBER FOR KRF LASERS [J]. APPLIED PHYSICS LETTERS, 1986, 49 (16) : 989 - 991

[4] PHOTON-ASSISTED DRY ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1984, 45 (04) : 475 - 477

[5] EXCIMER LASER PROJECTION ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1986, 49 (13) : 803 - 805

[6] BREWER PD, 1985, APPL PHYS LETT, V47, P3104

[7] ABSORPTION COEFFICIENTS OF OZONE IN ULTRAVIOLET AND VISIBLE REGIONS [J]. JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (02) : 857 - &

[8] XECL LASER CONTROLLED CHEMICAL ETCHING OF ALUMINUM IN CHLORINE GAS [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 40 (01): : 13 - 23

[9] EXCIMER LASER ETCHING OF AL METAL-FILMS IN CHLORINE ENVIRONMENTS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (10) : 1006 - 1008

[10] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR [J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032

[1] ASHBY CIH, 1984, APPL PHYS LETT, V45, P892, DOI 10.1063/1.95404

[2] DOPING LEVEL SELECTIVE PHOTOCHEMICAL DRY ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (08) : 752 - 754

[3] EFFECTIVE SATURABLE ABSORBER FOR KRF LASERS [J]. APPLIED PHYSICS LETTERS, 1986, 49 (16) : 989 - 991

[4] PHOTON-ASSISTED DRY ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1984, 45 (04) : 475 - 477

[5] EXCIMER LASER PROJECTION ETCHING OF GAAS [J]. APPLIED PHYSICS LETTERS, 1986, 49 (13) : 803 - 805

[6] BREWER PD, 1985, APPL PHYS LETT, V47, P3104

[7] ABSORPTION COEFFICIENTS OF OZONE IN ULTRAVIOLET AND VISIBLE REGIONS [J]. JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (02) : 857 - &

[8] XECL LASER CONTROLLED CHEMICAL ETCHING OF ALUMINUM IN CHLORINE GAS [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 40 (01): : 13 - 23

[9] EXCIMER LASER ETCHING OF AL METAL-FILMS IN CHLORINE ENVIRONMENTS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (10) : 1006 - 1008

[10] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR [J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032