SPIRAL HOLLOW-CATHODE PLASMA-ASSISTED DIAMOND DEPOSITION

被引:16
作者
TZENG, Y
KUNG, PJ
ZEE, R
LEGG, K
SOLNICKLEGG, H
BURNS, D
LOO, BH
机构
[1] IONIC ATLANTA INCORP,ATLANTA,GA 30309
[2] UNIV ALABAMA,DEPT CHEM,HUNTSVILLE,AL 35899
关键词
D O I
10.1063/1.100268
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2326 / 2327
页数:2
相关论文
共 6 条
[1]   DIAMOND CRYSTAL-GROWTH BY PLASMA CHEMICAL VAPOR-DEPOSITION [J].
CHANG, CP ;
FLAMM, DL ;
IBBOTSON, DE ;
MUCHA, JA .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1744-1748
[2]  
Field J.E., 1979, PROPERTIES DIAMOND
[3]   GROWTH OF DIAMOND PARTICLES FROM METHANE-HYDROGEN GAS [J].
MATSUMOTO, S ;
SATO, Y ;
TSUTSUMI, M ;
SETAKA, N .
JOURNAL OF MATERIALS SCIENCE, 1982, 17 (11) :3106-3112
[4]   SYNTHESIS OF DIAMOND FILMS IN A RF INDUCTION THERMAL PLASMA [J].
MATSUMOTO, S ;
HINO, M ;
KOBAYASHI, T .
APPLIED PHYSICS LETTERS, 1987, 51 (10) :737-739
[5]   GROWTH OF DIAMOND THIN-FILMS BY ELECTRON ASSISTED CHEMICAL VAPOR-DEPOSITION [J].
SAWABE, A ;
INUZUKA, T .
APPLIED PHYSICS LETTERS, 1985, 46 (02) :146-147
[6]   HOLLOW-CATHODE PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND [J].
SINGH, B ;
MESKER, OR ;
LEVINE, AW ;
ARIE, Y .
APPLIED PHYSICS LETTERS, 1988, 52 (20) :1658-1660