ON THE CAPACITANCE OF METAL THIN OXIDE SEMICONDUCTOR STRUCTURES WITH LOCALIZED OXIDE STATES

被引:1
作者
NANNINI, A [1 ]
BAGNOLI, PE [1 ]
机构
[1] UNIV PISA,FAC INGN,IST ELETTTR & TELECOMUN,I-56100 PISA,ITALY
关键词
D O I
10.1016/0038-1101(89)90086-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:337 / 338
页数:2
相关论文
共 5 条
[1]   EFFECTS OF INTERFACIAL STATES ON THE CAPACITANCE-VOLTAGE CHARACTERISTICS OF PD/SIO2/N-SI SCHOTTKY DIODES [J].
BAGNOLI, PE ;
NANNINI, A .
SOLID-STATE ELECTRONICS, 1987, 30 (10) :1005-1012
[2]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[4]  
DAVISON SG, 1970, SOLID STATE PHYS, V25, P1