EVALUATION OF DOUBLE-SIDED, AC-COUPLED, DOUBLE METAL-SILICON STRIP DETECTORS FOR H1 AT HERA

被引:14
作者
PITZL, D [1 ]
EICHLER, R [1 ]
ERDMANN, W [1 ]
GABATHULER, K [1 ]
HORISBERGER, R [1 ]
WAGENER, M [1 ]
机构
[1] PAUL SCHERRER INST,CH-5232 VILLIGEN,SWITZERLAND
关键词
D O I
10.1016/0168-9002(94)90779-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Prototype double sided silicon strip detectors for the H1 vertex detector have been fabricated. The design uses integrated coupling capacitors on both sides and a second metal layer with readout lines on the n-side. Measurements of leakage currents, sheet resistances, metal line quality and contact reliability all show satisfactory results. A multi-guard structure improves the high-voltage and long-term stability of the detectors. The accumulation layer channel resistors on the n-side showed dramatic radiation effects after Co-60 doses of 100 krad and an improved design with a metal gate electrode is demonstrated. Interstrip capacitances have been measured systematically on test structures with various geometries. The capacitance due to the second metal layer on the n-side has been measured for a 2 mum SiO2 and a 6 mum polyimide dielectric. Up to now, integrated coupling capacitors could not be fabricated with sufficiently low defect rates.
引用
收藏
页码:454 / 460
页数:7
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