LASER-ASSISTED CHEMICAL VAPOR-DEPOSITION OF SI - LOW-TEMPERATURE (LESS-THAN 600-DEGREES-C) GROWTH OF EPITAXIAL AND POLYCRYSTALLINE LAYERS

被引：18

作者：

SUZUKI, K

LUBBEN, D

GREENE, JE

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 02期

关键词：

D O I：

10.1063/1.336144

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：979 / 982

页数：4

共 25 条

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