MICROSTRUCTURE OF SI3N4-TIN COMPOSITES PREPARED BY CHEMICAL-VAPOR DEPOSITION

被引：23

作者：

HAYASHI, S

HIRAI, T

HIRAGA, K

HIRABAYASHI, M

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1982年 / 17卷 / 11期

关键词：

D O I：

10.1007/BF01203503

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3336 / 3340

页数：5

共 8 条

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[4]

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[8] SELECTIVE STUDIES OF CHEMICAL VAPOR-DEPOSITED ALUMINUM NITRIDE SILICON NITRIDE MIXTURE FILMS [J].

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