SELECTIVE STUDIES OF CHEMICAL VAPOR-DEPOSITED ALUMINUM NITRIDE SILICON NITRIDE MIXTURE FILMS

被引:25
作者
ZIRINSKY, S
IRENE, EA
机构
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D O I
10.1149/1.2131433
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:305 / 314
页数:10
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