CHEMICAL VAPOR-DEPOSITION IN SYSTEMS SILICON-CARBON AND SILICON-CARBON-NITROGEN

被引：18

作者：

NICKL, JJ ^{[1
]}

VONBRAUN.C ^{[1
]}

机构：

[1] UNIV MUNICH,INST ANORG CHEM,FORSCH LAB FESTKORPERCHEM,MUNICH,WEST GERMANY

来源：

JOURNAL OF THE LESS-COMMON METALS | 1974年 / 37卷 / 03期

关键词：

D O I：

10.1016/0022-5088(74)90024-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：317 / 329

页数：13

共 15 条

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[8] GAS PHASE DEPOSITING IN SILICON-CARBON SYSTEM [J].

NICKL, JJ ;

BRAUNMUH.CV .

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[9] MORPHOLOGY OF GAS-PHASE DEPOSITED SYSTEM TITANIUM CARBIDE-GRAPHITE [J].

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[10] BETA-SILICON CARBIDE FILMS [J].

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