ROLE OF IONS IN ION-BASED FILM FORMATION

被引：173

作者：

TAKAGI, T

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(82)90183-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1 / 17

页数：17

共 72 条

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[3] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .4. ION-SOURCE MODIFICATION
AMANO, J
LAWSON, RPW
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[4] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS
AMANO, J
LAWSON, RPW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (02): : 690 - 694
[5] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN
AMANO, J
BRYCE, P
LAWSON, RPW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02): : 591 - 595
[6] EFFECT OF ION IRRADIATION ON FORMATION, STRUCTURE AND PROPERTIES OF THIN METAL-FILMS
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BYKOV, JV
GUSEVA, MB
[J]. THIN SOLID FILMS, 1976, 38 (01) : 1 - 8
[7] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[8] BUNSHAH RF, 1977, 7TH P INT VAC C 3RD, P1553
[9] CAMPBELL DS, 1978, ACTIVE PASSIVE THIN, pCH2
[10] CHEN D, 1973, IEEE T MAGN, VMAG9, P66, DOI 10.1109/TMAG.1973.1067580