TIME-RESOLVED REFLECTIVITY AND MELTING DEPTH MEASUREMENTS USING PULSED RUBY-LASER ON SILICON

被引：16

作者：

TOULEMONDE, M ^{[1
]}

UNAMUNO, S ^{[1
]}

HEDDACHE, R ^{[1
]}

LAMPERT, MO ^{[1
]}

HAGEALI, M ^{[1
]}

SIFFERT, P ^{[1
]}

机构：

[1] CRN PHASE,F-67037 STRASBOURG,FRANCE

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1985年 / 36卷 / 01期

关键词：

D O I：

10.1007/BF00616457

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：31 / 36

页数：6

相关论文

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