TRANSIENT ISOTHERMAL GENERATION AT SILICON-SILICON OXIDE INTERFACE AND DIRECT DETERMINATION OF INTERFACE TRAP DISTRIBUTION

被引:12
作者
SIMMONS, JG [1 ]
MAR, HA [1 ]
机构
[1] UNIV TORONTO, ELECT ENGN DEPT, TORONTO M5S 1A7, ONTARIO, CANADA
关键词
D O I
10.1016/0038-1101(76)90072-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:369 / 374
页数:6
相关论文
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