SI-SIO2 INTERFACE - ELECTRICAL PROPERTIES AS DETERMINED BY METAL-INSULATOR-SILICON CONDUCTANCE TECHNIQUE

被引:1831
作者
NICOLLIA.EH
GOETZBER.A
机构
来源
BELL SYSTEM TECHNICAL JOURNAL | 1967年 / 46卷 / 06期
关键词
D O I
10.1002/j.1538-7305.1967.tb01727.x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1055 / +
页数:1
相关论文
共 34 条
[1]   SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (10) :701-+
[3]  
CRAMER H, 1955, ELEMENTS PROBABILITY, pCH6
[5]  
DAVENPORT WB, 1958, INTRODUCTION THEORY, pCH3
[6]   CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON [J].
DEAL, BE ;
SKLAR, M ;
GROVE, AS ;
SNOW, EH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (03) :266-+
[7]  
FROLICH H, 1958, THEORY DIELECTRICS, pCH3
[8]   AVALANCHE EFFECTS IN SILICON P-N JUNCTIONS .2. STRUCTURALLY PERFECT JUNCTIONS [J].
GOETZBERGER, A ;
SCARLETT, RM ;
HAITZ, RH ;
MCDONALD, B .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) :1591-+
[9]   IMPROVED PROPERTIES OF SILICON DIOXIDE LAYERS GROWN UNDER BIAS [J].
GOETZBERGER, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (2P1) :138-+
[10]  
GOETZBERGER A, 1967, BELL SYST TECH J, V46, P513