REACTIONS OF XEF2 CHEMISORBED ON SI(111)7X7

[1] X-RAY PHOTOEMISSION MOLECULAR-ORBITALS OF HYDROGEN-FLUORIDE AND FLUORINATED METHANES [J]. JOURNAL OF CHEMICAL PHYSICS, 1974, 61 (11) : 4780 - 4786

[2] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[3] ELECTRON MEAN ESCAPE DEPTHS FROM X-RAY PHOTOELECTRON-SPECTRA OF THERMALLY OXIDIZED SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 305 - 308

[4] PHOTOELECTRON-SPECTRA OF FLUORINATED AMORPHOUS-SILICON (A-SI-F) [J]. PHYSICAL REVIEW B, 1981, 24 (04): : 2069 - 2080

[5] MASS AND ENERGY-DISTRIBUTION OF PARTICLES SPUTTER ETCHED FROM SI IN A XEF2 ENVIRONMENT [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 174 - 176

[6] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .1. INFLUENCE OF DOPING ON STEADY-STATE PHENOMENA [J]. JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (09) : 4237 - 4246

[7] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[8] COMPARISON OF XEF2 AND F-ATOM REACTIONS WITH SI AND SIO2 [J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1129 - 1131

[9] SYNCHROTRON PHOTOEMISSION INVESTIGATION OF THE INITIAL-STAGES OF FLUORINE ATTACK ON SI SURFACES - RELATIVE ABUNDANCE OF FLUOROSILYL SPECIES [J]. PHYSICAL REVIEW B, 1984, 30 (02): : 764 - 770

[10] MCFEELY FR, 1984, B AM PHYS SOC, V29, P553

[1] X-RAY PHOTOEMISSION MOLECULAR-ORBITALS OF HYDROGEN-FLUORIDE AND FLUORINATED METHANES [J]. JOURNAL OF CHEMICAL PHYSICS, 1974, 61 (11) : 4780 - 4786

[2] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[3] ELECTRON MEAN ESCAPE DEPTHS FROM X-RAY PHOTOELECTRON-SPECTRA OF THERMALLY OXIDIZED SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 305 - 308

[4] PHOTOELECTRON-SPECTRA OF FLUORINATED AMORPHOUS-SILICON (A-SI-F) [J]. PHYSICAL REVIEW B, 1981, 24 (04): : 2069 - 2080

[5] MASS AND ENERGY-DISTRIBUTION OF PARTICLES SPUTTER ETCHED FROM SI IN A XEF2 ENVIRONMENT [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 174 - 176

[6] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .1. INFLUENCE OF DOPING ON STEADY-STATE PHENOMENA [J]. JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (09) : 4237 - 4246

[7] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[8] COMPARISON OF XEF2 AND F-ATOM REACTIONS WITH SI AND SIO2 [J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1129 - 1131

[9] SYNCHROTRON PHOTOEMISSION INVESTIGATION OF THE INITIAL-STAGES OF FLUORINE ATTACK ON SI SURFACES - RELATIVE ABUNDANCE OF FLUOROSILYL SPECIES [J]. PHYSICAL REVIEW B, 1984, 30 (02): : 764 - 770

[10] MCFEELY FR, 1984, B AM PHYS SOC, V29, P553